| 摘要 |
PURPOSE: A lithographic projection apparatus, device manufacturing method using the apparatus, and device manufactured by the method is provided to improve an yield rate by controlling an illuminating system. CONSTITUTION: An emission system(LA, Ex, IN, CO) provides an emission projection beam(PB) such as an ultraviolet ray or a far ultraviolet ray. A first object table(mask table)(MT) has a mask holder for fixing a mask(MA) and is connected to a first position determining means for accurately determining a position of the mask(MA) related to a component(PL). A second object table(substrate table)(WT) has a substrate holder for fixing a substrate(W) such as a silicon wafer covered by a resist and is connected to a second position determining means for accurately determining a position of a substrate related to the component(PL). A projection system(PL) focuses an emission of the mask(MA) on a target region of the substrate(W).
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