| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a color filter improved in the absorption and landing point precision of ink and capable of preventing the occurrence of color mixing and reducing the reflectance of a light-shielding layer by using a photosensitive color compsn. and nickel by electroless plating as materials for a matrix light- shielding layer. SOLUTION: A photosensitive color compsn. to form a light-shielding layer is used to form a light-shielding layer in a matrix state in a photolithographic process. Then a metal nickel film is formed on the matrix light-shielding layer 5. An image accepting layer 3 having high affinity with ink is applied, and further an ink having desired color characteristics is applied by ink-jet method to form a patterned color layer 4. The transparent substrate 2 preferably has enough strength, flatness, heat resistance, light-transmitting property or the like. The dye used for the photosensitive color compsn. is preferably a mixture prepared by mixing carbon black to a pseudo-black mixture to which an org. pigment is mixed. A dispersant, solvent or the like is added to prepare a paste, to which photopolymerizable monomers and a photopolymn. initiator are added to obtain the photosensitive color compsn. for the formation of a light-shielding layer.</p> |
