| 发明名称 |
Ultrasonic photoresist process monitor and method |
| 摘要 |
There is provided a monitor and method for monitoring the condition of a photoresist film on a wafer during baking in which the phase of high frequency ultrasonic pulses reflected from the wafer/photoresist interface provides an indication of the condition of the photoresist film.
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| 申请公布号 |
US6026688(A) |
申请公布日期 |
2000.02.22 |
| 申请号 |
US19970943575 |
申请日期 |
1997.10.03 |
| 申请人 |
THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIVERSITY |
发明人 |
KHURI-YAKUB, BUHRUS T.;MORTON, SUSAN;DEGERTEKIN, F. LEVENT |
| 分类号 |
G01N29/07;G01N29/46;(IPC1-7):G01N29/10;G01N29/08 |
主分类号 |
G01N29/07 |
| 代理机构 |
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