| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam transfer device which is capable of providing an extensive unit exposure area even when the emittance of an electron gun is relatively low, and reducing a harmful effect caused by the space charge effect. SOLUTION: An illumination optical system of an electron beam transfer device is provided with an electron gun 1 having a cathode 1a to emit the electron beam substantially only from a concentric ring-like part 2 on a discharge surface, and a beam part in the vicinity of a cross-over formed by the electron gun and approximately uniform in intensity distribution is image-formed on a surface which is optically conjugate with a reticle. The beam which is high in emittance, uniform and extensive can be obtained.
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