| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target excellent in stability of electric discharge property and particle property, which is capable of forming a Cr-V thin film excellent as a substrate layer for magnetic thin film constituting a magnetic disk. SOLUTION: A sputtering target is a sintered alloy substantially composed of Cr and V, and is constituted by using a sintered alloy which contains Cr and V particles having particle sizes of <250μm, 10-50 atom.% V and 0-(0.0028×C) wt.% oxygen, wherein C is V content in atom.%.
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