发明名称 |
Blanking system for electron beam projection system |
摘要 |
A charged particle beam projection system includes a source of charged particles and a first doublet of condenser lenses with a first symmetry plane through which the beam is directed, located lower on the column. A trim aperture element is located at the first symmetry plane of the first doublet wherein the trim aperture serves as a first blanking aperture. Below the trim aperture there is a shaping aperture. Next is a second doublet of condenser lenses with a second symmetry plane. A third aperture, which is located at the symmetry plane of the second doublet serves as another blanking aperture.
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申请公布号 |
US6023067(A) |
申请公布日期 |
2000.02.08 |
申请号 |
US19980138592 |
申请日期 |
1998.08.22 |
申请人 |
NIKON CORPORATION |
发明人 |
STICKEL, WERNER;GOLLADAY, STEVEN DOUGLAS |
分类号 |
H01J37/09;G03F7/20;H01J37/04;H01J37/147;H01J37/30;H01J37/305;H01L21/027;(IPC1-7):H01J37/09 |
主分类号 |
H01J37/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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