发明名称 |
CAPACITOR AND FABRICATING METHOD OF THE SAME |
摘要 |
PURPOSE: A capacitor is provided to prevent an electric bridge between storage nodes resulting from slope etching of transition metal by forming a thin transition metal layer and a polysilicon layer to be thin and thick, respectively. CONSTITUTION: The capacitor comprises a storage contact plug penetrating an insulating layer formed on a semiconductor substrate to be electrically connected to the semiconductor substrate; a conductive layer formed on a part of the insulating layer at the storage contact plug and both sides thereof; a barrier metal layer formed on the conductive layer to cover a top surface and both sidewalls of the conductive layer; a transition metal layer formed on the barrier metal layer to cover a top surface and both sidewalls of the barrier metal layer; and a dielectric film formed on the transition metal layer to cover a top surface and both sidewalls of the transition meta layer.
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申请公布号 |
KR20000007541(A) |
申请公布日期 |
2000.02.07 |
申请号 |
KR19980026919 |
申请日期 |
1998.07.03 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JUN, YUN SU;HWANG, YU SANG;CHUNG, TAE YEONG |
分类号 |
H01L27/108;H01L21/02;H01L21/8242;H01L29/92;(IPC1-7):H01L27/108 |
主分类号 |
H01L27/108 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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