发明名称 CAPACITOR AND FABRICATING METHOD OF THE SAME
摘要 PURPOSE: A capacitor is provided to prevent an electric bridge between storage nodes resulting from slope etching of transition metal by forming a thin transition metal layer and a polysilicon layer to be thin and thick, respectively. CONSTITUTION: The capacitor comprises a storage contact plug penetrating an insulating layer formed on a semiconductor substrate to be electrically connected to the semiconductor substrate; a conductive layer formed on a part of the insulating layer at the storage contact plug and both sides thereof; a barrier metal layer formed on the conductive layer to cover a top surface and both sidewalls of the conductive layer; a transition metal layer formed on the barrier metal layer to cover a top surface and both sidewalls of the barrier metal layer; and a dielectric film formed on the transition metal layer to cover a top surface and both sidewalls of the transition meta layer.
申请公布号 KR20000007541(A) 申请公布日期 2000.02.07
申请号 KR19980026919 申请日期 1998.07.03
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JUN, YUN SU;HWANG, YU SANG;CHUNG, TAE YEONG
分类号 H01L27/108;H01L21/02;H01L21/8242;H01L29/92;(IPC1-7):H01L27/108 主分类号 H01L27/108
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