| 摘要 |
PURPOSE: A photoresist supply system is provided to prevent waste of high-priced photoresist solution and lowering of productivity by constantly maintaining an amount of photoresist solution contained in a bottle CONSTITUTION: The system comprises a first bottle as a supply source of photoresist solution; a second bottle, installed to be opposite to an upper portion of the first bottle, supplying the photoresist solution to the first bottle; a first tube of which one end is successively coupled to a nozzle through a pump and a filter and the other end is extended to an internal bottom; a second tube of which one end, separately from the first tube, is extended to a position not to be contacted to a photoresist in the first bottle and the other end is coupled to a nitrogen gas supply source to supply nitrogen gas into the first bottle; a third tube, installed between the first bottle and the second bottle, of which one end is extended to a constant position in the first tube and the other end is extended to an internal upper end of the second tube; and a fourth tube, installed between the first bottle and the second bottle, of which one end is extended to a middle position of a first and a third tube extension parts and the other end is coupled to an inlet of the second tube.
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