发明名称 |
SEMICONDUCTOR MEMORY DEVICE AND FABRICATING METHOD THEREOF |
摘要 |
PURPOSE: A semiconductor memory device is provided to increase capacitance by extending an area of a capacitor. CONSTITUTION: The device comprises a semiconductor substrate; an insulating layer having a contact hole formed on the semiconductor substrate; a storage node formed on the insulating layer including the contact hole, wherein the storage node is cross on a layout; a dielectric film formed on a surface of the storage node; and a plate node formed on the insulating layer including the dielectric film.
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申请公布号 |
KR20000007365(A) |
申请公布日期 |
2000.02.07 |
申请号 |
KR19980026656 |
申请日期 |
1998.07.02 |
申请人 |
HYUNDAI MICRO ELECTRONICS CO., LTD. |
发明人 |
LA, SA GYUN |
分类号 |
H01L21/8242;(IPC1-7):H01L21/824 |
主分类号 |
H01L21/8242 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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