发明名称 SEMICONDUCTOR MEMORY DEVICE AND FABRICATING METHOD THEREOF
摘要 PURPOSE: A semiconductor memory device is provided to increase capacitance by extending an area of a capacitor. CONSTITUTION: The device comprises a semiconductor substrate; an insulating layer having a contact hole formed on the semiconductor substrate; a storage node formed on the insulating layer including the contact hole, wherein the storage node is cross on a layout; a dielectric film formed on a surface of the storage node; and a plate node formed on the insulating layer including the dielectric film.
申请公布号 KR20000007365(A) 申请公布日期 2000.02.07
申请号 KR19980026656 申请日期 1998.07.02
申请人 HYUNDAI MICRO ELECTRONICS CO., LTD. 发明人 LA, SA GYUN
分类号 H01L21/8242;(IPC1-7):H01L21/824 主分类号 H01L21/8242
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