Systems and methods for removing residue from process gases exhausted from microelectronic device fabrication processes

摘要

Process gases from microelectronic device fabrication processes are pumped through a filter unit including a plurality of absorbers for absorbing water entrained within the process gases. Residues deposited within the filtering unit are removed by spraying water on the absorbers. Water is prevented from escaping from the filtering unit into other portions of an exhaust gas system or into the environment by providing a curtain of pressurized, inert gas, within the filtering unit.