| 摘要 |
A head wall apparatus includes a support configured to be coupled to a wall. A front panel is coupled to the support to define an interior region of the head wall. A plurality of first gas blocks are coupled to the support, and a plurality of second gas blocks are also coupled to the support spaced apart from the first gas blocks. Each of the first and second gas blocks have an inlet and an outlet. The apparatus further includes a plurality of first and second gas supply hoses located in the interior region which are coupled to the first and second gas supply blocks, respectively. At least one divider is coupled to the support within the interior region. The at least one divider is configured to separate the first and second gas supply hoses into first and second separate pathways within the interior region. |
