摘要 |
<p>The invention relates to a self-curing, photochemically or thermally curable resinous dental composition based on polymerisable polysiloxanes, to a process for its preparation and to its use for the preparation of pasty, self-curing, photochemically or thermally curable dental materials. Said composition is obtainable by hydrolytic condensation of one or more hydrolytically condensable silicon compounds, 1 to 100 mol %, based on monomeric compounds, of silanes of the general formula: Yn-SiXmR4-(n+m) and/or {XnRkSi[R2(A)l]4-(n+k)}xB being selected. The radicals A, X, Y, R2, R' and R are identical or different and have the following meaning: A=O, S, PR', POR', NHC(O)O or NHC(O)ONR', B=a straight-chain or branched organic radical which is derived from a compound B' having at least one (for l=1 and A=NHC(O)O or NHC(O)NR') or at least two C=C double bonds and 5 to 50 carbon atoms, R=alkyl, alkenyl, aryl, alkylaryl or arylalkyl, R'=H, alkyl or aryl, R2=alkylene, arylene or alkylenearylene, X=H, halogen, hydroxyl, alkoxy, acyloxy, alkylcarbonyl, alkoxycarbonyl or NR'2, Y=a substituent which contains a substituted or unsubstituted 1,4,6-trioxaspiro[4.4]nonane radical, n=1, 2 or 3, m=1, 2 or 3, where n+m</=4, k=0, 1 or 2, l=0 or 1, x=an integer whose value is stated in the description.</p> |