发明名称 TOTAL REFLECTION X-RAY PHOTOELECTRON SPECTROMETER
摘要 <p>PROBLEM TO BE SOLVED: To provide a total reflection X-ray photoelectron spectrometer capable of easily setting the sample tilt angle for XPS measurement under the total reflection condition. SOLUTION: This total reflection X-ray photoelectron spectrometer is provided with an X-ray monochromator 3 monochromating the radiated X-rays, a sample tilt mechanism capable of adjusting the sample tilt angle for radiating the monochromated X-rays to a sample surface under the total reflection condition, and an electrostatic semispherical photoelectron energy analyzer 1 energy- distinguishing and detecting the photoelectrons emitted from the sample. This device is provided with a data collection unit 7, a sample stage control unit 8 and an XPS measurement computer 9 for setting the optimum tilt angle based on the profile indicating the relation of the P/B ratio between the sample tilt angle and the perceived photoelectron peak or the relation of the sample tilt angle and the intensity ratio between the photoelectron peak of a sample electrode surface layer and the photoelectron peak of a substrate layer.</p>
申请公布号 JP2000030658(A) 申请公布日期 2000.01.28
申请号 JP19980212012 申请日期 1998.07.13
申请人 JEOL LTD 发明人 TAZAWA TOYOHIKO
分类号 H01J49/44;G01N23/227;(IPC1-7):H01J49/44 主分类号 H01J49/44
代理机构 代理人
主权项
地址