| 摘要 |
PROBLEM TO BE SOLVED: To provide a solution supplying device which can prevent treatment unevenness and, at the same time, can efficiently supply a solution. SOLUTION: A developing solution supplying device used for manufacturing semiconductor is provided with containers 8-1, 8-2, and 8-3 which store a developing solution supplied from a treating liquid supplying system 9, a nitrogen gas supplying system 35 which makes the developing solution to be discharged to a discharging system 7 by pressurizing the containers 8-1, 8-2, and 8-3, and bellows pumps 59, 60, and 61 which discharge the developing solution stored in the containers 8-1, 8-2, and 8-3 by prescribed amounts. The developing solution supplied from the treating liquid supplying system 9 is deaerated by means of a deaerating means 10, which reduces the pressures in the containers 8-1, 8-2, and 8-3 and left standing as it is until the solution is completely deaerated. Then the deaerated solution is discharged to wafers. |
