首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
Deodorant and process for deodorization using said deodorant
摘要
申请公布号
SG70105(A1)
申请公布日期
2000.01.25
申请号
SG19980002726
申请日期
1998.07.28
申请人
MITSUBISHI GAS CHEMICAL COMPANY, INC.
发明人
HAMAGUCHI TAKAYOSHI;MINATO KAZUYUKI;MATSUMOTO TOSHIMI;SHIMORURA TADASHI
分类号
C02F1/72;(IPC1-7):C02F1/72
主分类号
C02F1/72
代理机构
代理人
主权项
地址
您可能感兴趣的专利
DIGITAL CAMERA AND CONTROL METHOD THEREOF
METHOD FOR PRODUCING RIGID POLYURETHANE SLAB FOAM, RIGID POLYURETHANE SLAB FOAM AND INSULATING MATERIAL FOR PIPING
CLAMP MEMBER FOR WIRE BONDING
MOUNTING BOARD FOR LGA, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
METHOD OF MANUFACTURING NON-CONTACT COMMUNICATION MEMBER AND APPARATUS FOR MANUFACTURING NON-CONTACT COMMUNICATION MEMBER, AND METHOD OF MANUFACTURING INTERPOSER AND APPARATUS FOR MANUFACTURING INTERPOSER
ESCALATOR OR MOVING WALK WITH DRIVE PART
IN VIVO ANTIOXIDANT
MOBILE WIRELESS DEVICE
RESIN COMPOSITION FOR SEMICONDUCTOR SEALING AND SEMICONDUCTOR DEVICE
HUMECTANT, CELL ACTIVATOR, WHITENING AGENT AND ANTIOXIDANT
CALCIUM ABSORPTION PROMOTER
INTERIOR PARTS FOR AUTOMOBILE
LIPOLYSIS PROMOTER
MEDICINE FOR PREVENTING AND TREATING INFECTION IN PATIENT OF ALCOHOLIC HEPATIC DISEASE
WHEEL SUPPORTING ROLLING BEARING UNIT
IMAGE PROCESSING SYSTEM
OPTICAL DISK DEVICE
MASK DATA GENERATION PROGRAM, MASK DATA GENERATION METHOD, MASK FABRICATION METHOD, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD
METHOD FOR FORMING POLYIMIDE PATTERN, ARTICLE AND SUSPENSION FOR HARD DISK
RETICLE, RETICLE CASE, METHOD FOR HOLDING RETICLE, AND EXPOSURE DEVICE