PRODUCTION OF FLUORINE MODIFIED TITANIUM DIOXIDE FILM HAVING LOW CLOUDING DEGREE

摘要

PROBLEM TO BE SOLVED: To deposit a fluorine modified titanium dioxide film having a low clouding degree on hot glass by atmospheric pressure chemical vapor deposition(APCVD) using TiCl4 vapor. SOLUTION: TiCl4 is injected into a heated carrier gas not substantially contg. oxygen, the heated carrier gas and TiCl4 are mixed with a reactive gaseous stream contg. steam, a source of oxygen and a fluorine-contg. compd. of the amount enough to reduce cludiness and the mixture is brought into contact with a hot glass surface to deposit the objective fluorine modified TiO2 film on the hot glass surface.