摘要 |
PURPOSE: A method for making a thin conductive film applies a compressive stress about a conductive layer when forming a conductive layer, and prevents a film separation of the conductive layer. CONSTITUTION: When forming a conductive layer of a magnetic resistance effect element in a DC magnetron sputtering device, a tension stress is applied on the conductive layer. Therefore, a prior method easily occurs a film separation of the conductive layer. A lattice plane spacing of a vertical direction of the conductive layer(23) is larger than that of a bulk material. Thereby, a compressive stress is applied on the conductive layer, thereby preventing a film separation.
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