ALUMINUM COMPLEX DERIVATIVE FOR CHEMICAL VAPOR DEPOSITION AND PRODUCTION OF THE SAME DERIVATIVE

摘要

PROBLEM TO BE SOLVED: To obtain a new organometallic compound excellent in thermostability and useful for chemical vapor deposition, etc. SOLUTION: The new organometallic compound is expressed by the formula: H3Al:Ln [L is at least one of Lewis bases capable of giving Al lone pair, which are thiophenes, thiopyrans, or expressed by formula I or II (R is a 1-4C alkyl; R', R'', R35 to R38 are each H or a 1-2C alkyl; X is O or an alkyl-containing nitrogen); (n) is 1 or 2], e.g. 1-methylpyrrolidine alum. The compound of the formula: H3Al:Ln is obtained by forming a soil suspension of aluminum chloride and lithium aluminum hydride in hexane and then by adding a Lewis base such as 1-methylpyrrolidine to the suspension.