| 摘要 |
PROBLEM TO BE SOLVED: To produce high resolution by matching the direction in which the resolution of a projecting optical system is best with the direction of diffraction light emitted by a fine pattern on the surface of a first body. SOLUTION: A resolution determined by measurements is best in a direction Xa at an angleθin the counterclockwise direction with respect to a standard direction SD. The direction Xa is a direction in which RMS(root mean square) of resolutions (aberrations) calculated in all directions from the standard direction SD is minimum. Next, a mask is turned counterclockwise an angle ofθ' from the standard direction SD in such a way that the direction of diffraction light emitted by a fine pattern on the mask (first body) agrees with the Xa direction and a wafer is then turned counterclockwise an angle of (θ-θ') from the standard direction SD to match the Xa direction of the mask with the baking direction Xb of the wafer.
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