发明名称 LAMINATE STRUCTURE, WIRING STRUCTURE AND THEIR MANUFACTURE, AND SEMICONDUCTOR DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a laminate structure wherein the adhesion of a layer contg. an inorg. material as a main component to an org. layer can be enhanced. SOLUTION: A first layer is disposed on the main surface of a substrate having the main surface, an adhesive layer 3 is disposed on the first layer and made of fluorocarbon contg. Si, and a second layer is disposed on the adhesive layer 3. Either the first or second layer is made of a material 2 selected from among a group of materials contg. Si-contg. inorg. compds. as the main components, metals, or inorg. metal compds., and the other layer is formed of an org. insulation film 4.</p>
申请公布号 JP2000021873(A) 申请公布日期 2000.01.21
申请号 JP19980180918 申请日期 1998.06.26
申请人 FUJITSU LTD 发明人 TAKEISHI SHUNSAKU
分类号 B32B7/12;H01L21/312;H01L21/314;H01L21/316;H01L21/768;H01L23/532;(IPC1-7):H01L21/314 主分类号 B32B7/12
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