| 摘要 |
The present invention provides a method for segmenting and mapping a two-dimensional conventional circuit pattern to a flat mask (31) for projection onto a three-dimensional surface (34). The circuit pattern is first segmented into a plurality of circuit segments (Am(15), Bm(15), Cm(15)) enclosed in a plurality of base units of an imposed grid system. Subsequently, locations and the boundary conditions for a plurality of mask segments on the mask are determined such that no unneeded overlapping at the boundaries of the projected images (39) on the spherical shaped semiconductor device is possible (34). The mask, along with a photolithography system having a plurality of mirrors (MIRROR A, B, C), projects the circuit pattern onto the spherical shaped semiconductor device (34). |
