GAS SUPPLYING APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICES

摘要

PURPOSE: A gas supplying apparatus is provided to exactly control the pollution level of gas supplied to a process chamber by including a pollution sensing unit. CONSTITUTION: The process chamber(20) includes an MFC(mass flow controller)(24) and a valve(26) for controlling gas flow rate. The process chamber(20) further comprises a pollution sensing unit(28) formed on a line(22) for exactly sensing the gas pollution level supplied to the process chamber(20). Thereby, it is possible to improve a reliability of semiconductor devices by further comprising the pollution sensing unit(28).