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发明名称
COPOLYMER FOR PHOTORESIST AND MATRIX RESIN
摘要
申请公布号
KR100240824(B1)
申请公布日期
2000.01.15
申请号
KR19970066093
申请日期
1997.12.05
申请人
SAMSUNG GENERAL CHEMICALS CO.,LTD
发明人
LEE, SANG-KYUN;MOON, SUNG-YOON;MOON, SUNG-YOON;KOO, JA-SUN;KIM, CHUL-HEE
分类号
G03F7/039;(IPC1-7):G03F7/039
主分类号
G03F7/039
代理机构
代理人
主权项
地址
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