| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain a photosensitive paste that enables high aspect ratio and high precision patterning at a low cost. SOLUTION: The photosensitive paste contains inorg. fine particles and a photosensitive org. component as essential components and the photosensitive org. component contains a compd. represented by the formula R1R3N-L-NR2R4, wherein R1 and R2 are each a substituent having an ethylenically unsatd. group, R3 and R4 are each selected from among a substituent having an ethylenically unsatd. group, H, 1-20C alkyl, aryl or aralkyl, R3 and R4 may be mutually the same or different and L is a divalent combining group.</p> |
