发明名称 RADIATION SENSITIVE RESIN COMPOSITION
摘要 <p>PROBLEM TO BE SOLVED: To obtain a resin compsn. which can be applied in uniform thickness even onto a substrate made to have a large diameter by incorporating an alkali- soluble novolac resin and a specified compd. SOLUTION: This compsn. is made to contain an alkali-soluble novolac resin and a quinonediazide sulfonic acid ester of a polyphenol compd. expressed by formula I. In the formula I, R is hydrogen atom or an alkyl group, A is a bivalent group expressed by formula II, m is independently 1 to 3, n is independently an integer 0 to 3. The alkali-soluble novolac resin to be used is not specified as far as it is obtd. by polymn. condensation of phenols and aldehydes in the presence of an acidic catalyst, The phenols to be used in this case are phenol, o-cresol or the like. As for the aldehydes, formaldehyde, paraformaldehyde or the like can be used. As for the quinonediazide sulfonic acid ester, 1,2-benzoquinonediazide-4-sulfonic acid ester or the like can be used.</p>
申请公布号 JP2000010269(A) 申请公布日期 2000.01.14
申请号 JP19980189671 申请日期 1998.06.19
申请人 JSR CORP 发明人 INOMATA KATSUMI;AKIYAMA MASAHIRO;IWANAGA SHINICHIRO
分类号 G03F7/004;C08K5/42;C08L61/06;G03F7/039 主分类号 G03F7/004
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