发明名称 Spin-valve structure and method for making same
摘要 <p>The present invention concerns a spin-valve structure comprising a first and a second free ferromagnetic layer and an antiferromagnetic layer positioned between said first and second free ferromagnetic layer, characterised in that said first free ferromagnetic layer is positioned on a semiconductor substrate. It further concerns a method for producing a spin-valve structure, comprising the step of electrodeposition of said spin-valve structure on a semiconductor substrate. <IMAGE></p>
申请公布号 EP0971423(A1) 申请公布日期 2000.01.12
申请号 EP19980870160 申请日期 1998.07.10
申请人 INTERUNIVERSITAIR MICRO-ELEKTRONICA CENTRUM VZW 发明人 ATTENBOROUGH, KAREN;BOEVE, HANS;DE BOECK, JOHAN
分类号 G11B5/39;G01R33/09;G11C11/56;H01F10/08;H01F10/32;H01F41/26;H01F41/30;H01L43/08;H01L43/12;(IPC1-7):H01L43/12;G11C11/15 主分类号 G11B5/39
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