发明名称 ETCHING OF MULTILAYER ELECTRICALLY CONDUCTIVE FILM
摘要 PROBLEM TO BE SOLVED: To provide a method for etching a multilayer electrically conductive film capable of uniformly etching the whole body of a multilayer electrically conductive film coposed of a silver series thin film and a transparent oxide thin film essentially consisting of indium oxide, suppressing residues and side etches and improving the pattern precision thereof. SOLUTION: At the time of subjecting a multilayer electrically conductive film 5 composed by laminating a silver series thin film 3 and transparent oxide thin films 2 and 4 essentially consisting of indium oxide to etching with an etchant essentially consisting of sulfuric acid and nitrid acid, the etching is executed by using an etchant contg. a buffer for suppressing the volatilization of nitric acid.
申请公布号 JP2000008184(A) 申请公布日期 2000.01.11
申请号 JP19980177747 申请日期 1998.06.24
申请人 TOPPAN PRINTING CO LTD 发明人 FUKUYOSHI KENZO;KIMURA YUKIHIRO;IMAYOSHI KOJI
分类号 C23F1/16;H01L21/306;(IPC1-7):C23F1/16 主分类号 C23F1/16
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