发明名称 |
ETCHING OF MULTILAYER ELECTRICALLY CONDUCTIVE FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for etching a multilayer electrically conductive film capable of uniformly etching the whole body of a multilayer electrically conductive film coposed of a silver series thin film and a transparent oxide thin film essentially consisting of indium oxide, suppressing residues and side etches and improving the pattern precision thereof. SOLUTION: At the time of subjecting a multilayer electrically conductive film 5 composed by laminating a silver series thin film 3 and transparent oxide thin films 2 and 4 essentially consisting of indium oxide to etching with an etchant essentially consisting of sulfuric acid and nitrid acid, the etching is executed by using an etchant contg. a buffer for suppressing the volatilization of nitric acid.
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申请公布号 |
JP2000008184(A) |
申请公布日期 |
2000.01.11 |
申请号 |
JP19980177747 |
申请日期 |
1998.06.24 |
申请人 |
TOPPAN PRINTING CO LTD |
发明人 |
FUKUYOSHI KENZO;KIMURA YUKIHIRO;IMAYOSHI KOJI |
分类号 |
C23F1/16;H01L21/306;(IPC1-7):C23F1/16 |
主分类号 |
C23F1/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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