发明名称 |
METHOD AND APPARATUS FOR APPLYING PASTE |
摘要 |
PROBLEM TO BE SOLVED: To provide an applicator for paste which can control the thickness and width of application to a certain extent. SOLUTION: An applicator 11 for paste has a rotation support means and a contact application body 58. The rotation support means comprising a chuck device 34 and others, while supporting a ceramic structure 1, rotates the structure 1 around its axis. The contact application body 58 contacts the peripheral surface of the rotating structure 1 to apply paste P1 on a specified area of the ceramic structure 1.
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申请公布号 |
JP2000005671(A) |
申请公布日期 |
2000.01.11 |
申请号 |
JP19980179268 |
申请日期 |
1998.06.25 |
申请人 |
IBIDEN CO LTD |
发明人 |
OGATA TAKASHI;YAMAMURA NORIHIKO |
分类号 |
B01D46/00;B05C1/06;B05D1/26;B05D7/24;(IPC1-7):B05C1/06 |
主分类号 |
B01D46/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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