发明名称 GATE ELECTRODE STRUCTURES AND METHODS OF MANUFACTURE
摘要 Gate electrode structures used in field effect transistors and integrated circuits and methods of manufacture are disclosed. Improved work function and threshold modulation are provided by the methods and structures.
申请公布号 KR20080032197(A) 申请公布日期 2008.04.14
申请号 KR20087003802 申请日期 2006.07.12
申请人 APPLIED MATERIALS INC. 发明人 HUNG STEVEN;MINER GARY
分类号 H01L21/336 主分类号 H01L21/336
代理机构 代理人
主权项
地址