发明名称 METHOD FOR MODIFYING SURFACE OF FILM SHEET BY PLASMA TREATMENT AND APPARATUS THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a method in which air hardly intrudes into a plasma chamber during atmospheric plasma arc and an apparatus therefor. SOLUTION: This surface modifying apparatus has a plasma chamber 11 comprising a closed housing 11a, a discharge port 18a for a feedstock gas 25 at a neighbor of an inlet port 19a for a film sheet of the housing 11a, and on the other hand a charging port 18b for the feedstock gas 25 at a neighbor of an outlet port 19b for the film sheet 21 of the housing 11a. In this surface modifying apparatus, the raw material gas 25 is made to flow in the opposite direction to the transferring direction of the film sheet 21. That is, when the feedstock gas 25 is introduced from the raw material gas-charging port 18b and discharged from the feedstock gas-discharging port 18a, a part of the gas is discharged also from the film sheet inlet port 19a, and thereby outside air hardly intrudes into the plasma chamber 11 from the film sheet inlet port 19a.
申请公布号 JP2000007802(A) 申请公布日期 2000.01.11
申请号 JP19980180553 申请日期 1998.06.26
申请人 DAINIPPON PRINTING CO LTD 发明人 TSUZUKI ATSURO;OKA MOTOHIRO;MIYAKE HIDEYUKI;NAKAGAWA YOSHIKAZU;GOTO TAKAKAZU
分类号 C08J7/00;(IPC1-7):C08J7/00 主分类号 C08J7/00
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