| 摘要 |
A reactor 1 for the processing of a gaseous medium including a cylindrical reactor chamber 2 within which there is a hollow cylindrical bed 11 of active material 12, and the annular space 18, 311 between the outside of the bed of active material and the reactor chamber is arranged to provide an impedance to axial gas flow which increases in the direction of gas flow along the said annular spaces. The gases are constrained to flow through the bed by the tapered wall (Fig 5). In the embodiment the device is a plasma-assisted gas reactor, with co-axial perforated cylindrical electrodes 6 and 7 defining the borders of the active bed. |
