发明名称 METHOD AND SYSTEM FOR LITHOGRAPHY AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD UTILIZING THE SAME, AND ALIGNER
摘要 PROBLEM TO BE SOLVED: To realize a system, which performs finite intrinsic control of at least an exposure device, by providing a system observer device, which corrects or compensates a part of the operating parameter, which is set for every exposure device, independently of a process controller. SOLUTION: An insernet LAN(local area network) 50 is used for communication between respective devices. Furthermore, a machine controller(MC) 100 is provided between a host computer H.COM and an exposure unit. A master data processor(MDP) 110 performs information collection and control of the operating-state report from MC 100, replay to the MC 100 and the like. A concentrated information server(CIS) 120 sends back the hysteresis data required for the correction and the compensation of the operating parameter of a stepper to the MDP 110. This function is executed with the MDP 110. In the meantime, various kinds of devices 140, 150 and so on are connected through an LAN adaptor 130.
申请公布号 JP2000003867(A) 申请公布日期 2000.01.07
申请号 JP19990166516 申请日期 1999.06.14
申请人 NIKON CORP 发明人 UMADATE TOSHIKAZU;YAMAGUCHI MASASHI
分类号 H01L21/027;G03F7/20;(IPC1-7):H01L21/027 主分类号 H01L21/027
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