| 摘要 |
PROBLEM TO BE SOLVED: To provide a wafer peripheral aligner which can perform accurate step-like exposures along an outer edge of a circuit pattern for a semiconductor wafer peripheral part and can realize easy maintenance and inspection of an exposure light projecting part and a wafer mounting stand. SOLUTION: In a wafer peripheral aligner, which performs step-like exposure along an outer edge of a circuit pattern of a semiconductor wafer and executes maintenance/inspection from a maintenance surface which is one side surface of a device body, an exposure light projection part 3 is arranged in a gate-like supporting stand 2 fixed to a base stand 1, a wafer-counting stand 4 is made movable from a wafer carrying in/out station S1 of a counter maintenance surface side to an exposure treatment station S2 at a maintenance surface side through under a gate-like support stand and a semiconductor wafer is subjected to exposure treatment in an exposure treatment station. |
