| 摘要 |
PROBLEM TO BE SOLVED: To perform the exposure of the adequate amount of exposure on a photosensitive substrate, by determining the oscillation frequency of the exposure beam at the time of scanning exposure based on the adequate exposing amount for the second body and the energy of the exposed beam. SOLUTION: After the width in the scanning direction of a measured slit- shaped exposure region 26P is contained in a memory 25, a reticle R for exposure is set on a reticle stage 11. A wafer W for exposure is set on a reticle stage 11. A wafer W for exposure is mounted on a wafer holder 17, and exposing is started. An operator inputs the adequate amount of exposure for the wafer W for a main control system 14 from an input/output means 24. This adequate exposure amount is sent into an operating part 15 from a main control system 14. Then, the illuminance of the wafer W on the exposing surface is measured. Then, the measurement of the pulse energy of the pulse laser light from a light source 1 is finished, and the parameter (oscillation frequency) for controlling the exposing amount is determined.
|
