发明名称 Lithographic projection apparatus
摘要 A lithographic apparatus in which ultraviolet light is used to illuminate a mask and an image of the mask is projected onto a photo-cathode. Photo-electrons are emitted and projected onto a substrate to expose a radiation sensitive layer thereon. The photo-cathode is curved, e.g. to conform to a part-spherical surface. The photo-electrons may be focused and demagnified using a pseudo-monopole magnetic field. <IMAGE>
申请公布号 EP0969325(A2) 申请公布日期 2000.01.05
申请号 EP19990304777 申请日期 1999.06.18
申请人 ASM LITHOGRAPHY B.V. 发明人 BLEEKER, ARNO JAN
分类号 G03F1/00;G03F7/20;H01J37/317 主分类号 G03F1/00
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