| 摘要 |
<p>PROBLEM TO BE SOLVED: To position a stage at high speed and high reliability by controlling a master stage and a substrate stage without yawing occurring in the direction of a master scanning, in moving the master stage and the substrate stage along the scanning direction as synchronously controlling for scanning exposure. SOLUTION: In an aligner for reduction exposure, a mask stage 8 is driven in accordance with positioning error of a wafer stage 10 since synchronous control with master-slave mode is performed in translational direction (X, Y). Accordingly, movement of the mask stage 8 in accordance with the positioning error becomes greater than the positioning error on the wafer side. As a result, a driving resolution in the translational direction can be reduced. Since rotating errors of the wafer stage 10 and the mask stage 8 are independently controlled, respectively, without synchronous control, the amount of necessary operation is significantly reduced, the whole control performance is improved and reliability of the synchronous control and the upper limit of scanning exposure speed can be enhanced.</p> |
