发明名称 SCANNING EXPOSURE METHOD, SCANNING ALIGNER, AND DEVICE MANUFACTURING METHOD USING THE METHOD
摘要 <p>PROBLEM TO BE SOLVED: To measure the position of a reticle highly accurately, by using a laser interferometer with its measurement axis passing nearly the center of the irradiation region of the exposure beam of a scanning aligner, and by measuring through it the positional informations of the reticle which is related to the direction intersecting the direction of the synchronous movement of the reticle. SOLUTION: The optical axis of a laser interferometer 35 for a Y-axis is set onto the parallel line with the Y-axis passing a center 43a of a slit-form irradiation region 43 elongated in the Y-direction which is formed by an exposure ray on a reticle 7. When rotating the reticle 7, it is rotated using the center 43a of the irradiation region 43 as an axis. Further, the position of the reticle 7 which is related to the direction intersecting the direction of the synchronous movement of the reticle 7 is measured by the laser interferometer 35 for the Y-axis. As a result, since the measurement axis of the interferometer 35 passes nearly the center 43a of the irradiation region 43, the position of the reticle 7 relative to the irradiation region 43 can be measured highly accurately, e.g. even when the reticle 7 is rotated slightly.</p>
申请公布号 JPH11354435(A) 申请公布日期 1999.12.24
申请号 JP19990094225 申请日期 1999.03.31
申请人 NIKON CORP 发明人 NISHI TAKECHIKA
分类号 H01L21/68;G03F7/20;G03F9/00;G12B5/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/68
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