SCAN-EXPOSURE METHOD, SCANNING TYPE EXPOSURE DEVICE, AND MANUFACTURE OF THE DEVICE USING THE METHOD

摘要

PROBLEM TO BE SOLVED: To allow accurate synchronous movement of a mask (reticule) which is a first object and a sensitized substrate (wafer) which is a second object, during exposure by a slit-scan exposure method. SOLUTION: Using electromagnetic force motors as driving systems 32A and 32B for moving a reticule 7 and such driving system for moving a wafer, the reticule 7 and the wafer are moved synchronously at high speed and with high accuracy. In addition, the electromagnetic force motor is cooled to prevent the heating of the electromagnetic force motor from affecting scan-exposure.