| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical amplification type resist material capable of improving adhesion property without causing the deterioration of dry etching resistance or sensitivity. SOLUTION: A chemical amplification type resist material contains an acid sensitive polymer having a structural unit, which contains an alkali soluble group protected by a protective group and makes the polymer alkali soluble with the elimination of the alkali soluble group by acid, and an acid generating agent generating an acid by radiation ray exposure. In such a case, the protective group of the acid sensitive polymer is constituted so as to have a part containing at least one nitrile group having self elimination ability. |
