| 发明名称 |
METHOD OF ORGANIC FILM DEPOSITION |
| 摘要 |
A method of organic deposition comprises a first step of supporting a substrate on which a scintillator is formed using at least three sample support needles rising from a turntable, a second step of introducing the turntable supporting the substrate into a CVD chamber, and a third step of depositing organic CVD film over the entire surface of the substrate including the scintillator formed on it.
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| 申请公布号 |
WO9966351(A1) |
申请公布日期 |
1999.12.23 |
| 申请号 |
WO1999JP03269 |
申请日期 |
1999.06.18 |
| 申请人 |
HAMAMATSU PHOTONICS K.K.;HOMME, TAKUYA;TAKABAYASHI, TOSHIO;SATO, HIROTO |
发明人 |
HOMME, TAKUYA;TAKABAYASHI, TOSHIO;SATO, HIROTO |
| 分类号 |
B05D7/24;C08L67/02;C23C16/00;C30B25/02;C30B29/12;C30B29/54;C30B33/00;G01T1/00;G01T1/20;G21K4/00;(IPC1-7):G01T1/20 |
主分类号 |
B05D7/24 |
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