发明名称 PRODUCTION OF UNSUPPORTED THIN FILM PARTICLES
摘要 <p>A method and an apparatus for producing unsupported thin film particles are provided. The apparatus includes: (a) a vacuum chamber (20); (b) a rotatable drum (22) disposed within the vacuum chamber (20); (c) means within the vacuum chamber (20) for depositing a surface coating onto the drum when the drum is rotating; (d) means for depositing at least one thin film layer onto the surface coating (12) to provide a thin film structure (18) disposed atop the surface coating (12); and (e) a knife blade (24) disposed proximate to the surface (14) of the drum (22) such that a thin film structure (18) deposited onto the drum can be scraped away from the drum by the rotation of the drum. In the method a surface coating, such as a wax, is applied directly to the moving surface. Thereafter, one or more thin film layers is deposited upon the surface coating.</p>
申请公布号 WO1999065618(A1) 申请公布日期 1999.12.23
申请号 US1999012996 申请日期 1999.06.08
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