发明名称 Double-magnetron sputtering unit for large area reactive plasma-enhanced deposition of e.g. light absorbing layers on metal strips for solar absorbers or heat reflective layers on window glass
摘要 A double-magnetron sputtering unit has magnetrons with an inner magnetic pole (2) magnetic field strength lower than the outer magnetic pole (3) magnetic field strength. A medium frequency voltage double-magnetron sputtering unit has individual magnetrons in which the inner magnetic pole magnetic field strength, measured in the target plane, is lower than the outer magnetic pole magnetic field strength. Preferred Features: The inner magnetic pole (3) consists of a high permeability material such as St 37 and the outer magnetic pole (2) consists of a hard magnetic material such as SmCo or NdFeB.
申请公布号 DE19827587(A1) 申请公布日期 1999.12.23
申请号 DE19981027587 申请日期 1998.06.20
申请人 VON ARDENNE ANLAGENTECHNIK GMBH 发明人 SCHULZE, DIETMAR
分类号 C23C14/35;C23C16/26;C23C16/50;H01J37/34;(IPC1-7):H01J37/34 主分类号 C23C14/35
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