发明名称 Apparatus and method for measuring the roughness of a target material surface based upon the scattering of incident X-ray photons
摘要 An apparatus and method are present which use X-ray fluorescence techniques to determine the roughness of a target surface. The apparatus includes an X-ray source and an X-ray detector. The X-ray source produces primary X-ray photons formed into a primary X-ray beam, and the primary X-ray beam is directed to and incident upon the target surface. The X-ray detector is positioned to receive primary X-ray photons scattered by the target surface. A fraction of the primary X-ray photons scattered by the target surface is directly proportional to the roughness of the target surface. The roughness of the target surface is determined from the number of primary X-ray photons scattered by the target surface and received by the X-ray detector within a predetermined exposure time. The X-ray detector produces an output signal proportional to the energy levels of received X-ray photons. An energy range of interest is divided into segments. A computer system receives the X-ray detector output signals and increments corresponding counts associated with segments of the energy range of interest. Following exposure, the computer system produces a graph of the counts associated with each segment. The computer system also reviews the counts associated with a peak in the graph corresponding to the energy levels of the scattered primary X-ray photons, determines selected characteristics of the peak (e.g., a maximum count associated with the peak, the area under the peak, etc.), and uses calibration data to compute a surface roughness value.
申请公布号 US6005915(A) 申请公布日期 1999.12.21
申请号 US19970966158 申请日期 1997.11.07
申请人 ADVANCED MICRO DEVICES, INC. 发明人 HOSSAIN, TIM Z.;TIFFIN, DONALD A.;STANFORD, JOEL R.
分类号 G01N23/225;(IPC1-7):G01N23/201 主分类号 G01N23/225
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