| 摘要 |
<p>A process chamber (35) for processing a substrate (30) and monitoring the process conducted on the substrate (30), comprises a support (45), a gas distributor, and an exhaust (85). The process chamber (35) has a wall comprising a window (130) that allows light to be transmitted therethrough. Means are provided for reducing deposition of process residue from the process gas onto the window (130) during processing of the substrate (30). In one version, the window (130) comprises a transparent plate (135) covered by an overlying mask (140) that has at least one aperture (145) extending through the mask (140) so that light can be transmitted through the aperture (145) and the transparent plate (135).</p> |
