| 摘要 |
PROBLEM TO BE SOLVED: To obtain a device to suppress generation of a particle due to etching by constituting at least an inner surface contacting with plasma of a quartz glass member for dry etching with a synthetic quartz glass having uniform composition, reduced defects and striae. SOLUTION: A wafer 2 placed on a sample base 3 is disposed in a quartz glass bell jar 1. Plasma is generated by supplying an etching gas of CF4 , etc., from an introducing hole 5 into the bell jar 1 and by a synergistic effect between an electric field of a microwave introduced from a wave guide 7 through the quartz bell jar 1 and a magnetic field of a solenoid coil 4, and the electron generated therein etches a thin film of a wafer 2 surface. An inner surface of the quartz glass bell jar is constituted of a synthetic quartz glass. The synthetic quartz glass has preferably a plasma etching rate of <=40 nm/min and a variance quantity in a surface roughness Rmax of <=1 nm/min. Further, a quartz glass member is preferably of a plate. |
