发明名称 Feldeffekttransistor mit Kammstruktur
摘要 A semiconductor device has a structure in which pluralities of gate electrodes, drain electrodes, and source electrodes are alternately arranged in parallel with one another. The semiconductor device includes an isolation area formed in a direction perpendicular to the gate electrode so as to divide an active layer area formed on a semiconductor substrate into a plurality of active layer areas. <IMAGE>
申请公布号 DE69602632(T2) 申请公布日期 1999.12.09
申请号 DE1996602632T 申请日期 1996.02.05
申请人 NEC CORP., TOKIO/TOKYO 发明人 ASANO, KAZUNORI
分类号 H01L21/338;H01L23/482;H01L29/06;H01L29/10;H01L29/812;(IPC1-7):H01L29/10;H01L23/66 主分类号 H01L21/338
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