发明名称 Thin film transistor, manufacturing method therefor and liquid crystal display unit using the same
摘要 With a conventional thin film transistor comprising a plurality of series-connected thin film transistors each having a plurality of LDD structures, leakage current can be decreased to a large effect but the area of an element can hardly be reduced. By connecting gate electrodes (15) of a plurality of thin film transistors only with an implanted region (13b) which is formed by implanting an impurity at a low concentration into a semiconductor thin film employed as an active layer, both reduction in element size and decrease in leakage current can be realized. <IMAGE>
申请公布号 EP0871227(A3) 申请公布日期 1999.12.08
申请号 EP19980106371 申请日期 1998.04.07
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 FURATA, MAMORU
分类号 G02F1/136;G02F1/1362;G02F1/1368;H01L21/336;H01L21/77;H01L21/84;H01L27/12;H01L29/49;H01L29/786 主分类号 G02F1/136
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