发明名称 |
Copper replenishment technique for precision copper plating system |
摘要 |
A copper replenishment system for replenishing copper which is depleted from a copper plating solution. The replenishment is achieved by the use of a compact filter cartridge, which is inserted into a recirculating loop for the solution. The filter cartridge contains a chemical, which when reacting with the solution replenishes the copper into the solution. The filter cartridge is a compact unit which can be easily handled and reduces the amount of contaminants that could be introduced by the presence of the replenishment chemical.
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申请公布号 |
US5997712(A) |
申请公布日期 |
1999.12.07 |
申请号 |
US19980050769 |
申请日期 |
1998.03.30 |
申请人 |
CUTEK RESEARCH, INC. |
发明人 |
TING, CHIU H.;CHO, PETER;LIN, FRANK;ANDRYUSHCHENKO, TANYA |
分类号 |
C25D21/18;(IPC1-7):C25D21/18 |
主分类号 |
C25D21/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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