TANTALUM SPUTTERING TARGET AND METHOD OF MANUFACTURE
摘要
Described is a method for producing high purity tantalum, the high purity tantalum so produced and sputtering targets of high purity tantalum. The method involves purifying starting materials followed by subsequent refining into high purity tantalum.
申请公布号
WO9961670(A1)
申请公布日期
1999.12.02
申请号
WO1999US11691
申请日期
1999.05.26
申请人
THE ALTA GROUP, INC.;ROSENBERG, HARRY;OZTURK, BAHRI;WANG, GUANGXIN;LARUE, WESLEY
