| 摘要 |
<p>A resin composition for photoresists which comprises a polymer having units derived from an acid-sensitive compound represented by either of formulae (1) and (2) (e.g., adamantane skeleton) and a photo-acid generator. Rl may be an alkyl group having a tertiary carbon atom in the 1-position and ring Z is a crosslinked cyclic hydrocarbon comprising two to four rings. (In said formulae, R?1 and R2¿ are the same or different and each represents hydrogen, alkyl, or cycloalkyl; R3 represents hydrogen or methyl; R4 represents hydrogen, halogeno, alkyl, an oxygenic group, amino, or N-substituted amino; ring Z represents a mono- or polycyclic aliphatic hydrocarbon; and n is an integer of 1 or larger, provided that not all of R4's are hydrogen. In formula (1), R?1 and R2¿ may form an alicyclic hydrocarbon in cooperation with the adjacent carbon atom). The composition has high resistance to etchants, becomes soluble upon irradiation with light, and can form a finer pattern.</p> |
